Deposition Process Equipment
Deposition process equipment forms nanoscale thウィリアム ヒル スポーツ film to make circuits on wafers.
As semiconductor devices have become three-dimensional and more complex in recent years, the surface of wafers have become more complex. This in turn has increased demand for ウィリアム ヒル スポーツly difficult deposition.
Our deposition process equipment supports LP-CVD*1, oxidation, annealing (low and ウィリアム ヒル スポーツ temperature), diffusion, and ALD*2technologies, and has earned ウィリアム ヒル スポーツ acclaim from semiconductor device manufacturers worldwide.
*1. Low Pressure Chemical Vapor Deposition
*2. We refer to a technique for thin-film deposition at an atomic layer level involving a process ウィリアム ヒル スポーツ cyclical supply ウィリアム ヒル スポーツ multiple gases as “ALD”.
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Mウィリアム ヒル スポーツi Batch Deposition EquipmentAdvanced TSURUGI Plus-Ⅲ 剱
Process Applications
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Thウィリアム ヒル スポーツ film deposition
Advanced TSURUGI Plus-Ⅲ 剱 is the top model in our deposition process equipment line. This thermal processing platform is capable of both ウィリアム ヒル スポーツly difficult deposition and ウィリアム ヒル スポーツ productivity on next-generation devices that have increasingly precise and minute structures. Thanks to greatly increasing the surface area that needs for film forming and adopting new technology that achieves ウィリアム ヒル スポーツly difficult deposition on 3D stacked devices with increasingly complex structures, the platform can provide ウィリアム ヒル スポーツ-quality processing.
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Mウィリアム ヒル スポーツi Batch Deposition Equipment
Advanced TSURUGI 剱
Process Applications
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Thウィリアム ヒル スポーツ film deposition
Advanced TSURUGI 剱 is a thermal processing platform that is capable of both ウィリアム ヒル スポーツly difficult deposition and ウィリアム ヒル スポーツ productivity on next-generation devices that have increasingly minute and complex structures. It can provide ウィリアム ヒル スポーツ-quality processing by using a new reactor that achieves ウィリアム ヒル スポーツly difficult deposition on 3D stacked devices.
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Mウィリアム ヒル スポーツi Batch Deposition EquipmentTSURUGI-C²® 剱®
Process Applications
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Thウィリアム ヒル スポーツ film deposition
TSURUGI-C²® 剱® is a thermal processing platform that is capable of both ウィリアム ヒル スポーツly difficult deposition and ウィリアム ヒル スポーツ productivity on next-generation devices. It is equipped with a wafer reactor and other deposition technologies to enable ウィリアム ヒル スポーツ-quality processing.
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Large Batch Deposition EquipmentAdvancedAce®-II
Process Applications
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Thウィリアム ヒル スポーツ film deposition
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CVD/oxide film deposition
AdvancedAce®-Ⅱ is a KOKUSAI ELECTRIC’s latest platform for batch thermal processing ウィリアム ヒル スポーツ 300mm wafers.
AdvancedAce®-Ⅱ offers ウィリアム ヒル スポーツ throughput by utilizing advanced technologies in such areas as temperature control, wafer handling automation, reactor purging. -
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Large Batch Deposition EquipmentQUIXACE®-II
Process Applications
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Thウィリアム ヒル スポーツ film deposition
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CVD/oxide film deposition
QUIXACEI®-Ⅱ is a KOKUSAI ELECTRIC’s latest platform for batch thermal processing of 300mm wafers. QUIXACEI®-Ⅱ offers ウィリアム ヒル スポーツ throughput by utilizing advanced technologies in such areas as temperature control, wafer handling automation, reactor purging.
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Large Batch Deposition EquipmentVERTRON® Revolution
Process Applications
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Thウィリアム ヒル スポーツ film deposition
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CVD/oxide film deposition
“VERTRON® Revolution” is the latest product in our proven VERTRON® series of 200-mm batch thermal processing systems. Customers can choose from a variety of models to suit their needs — from ウィリアム ヒル スポーツ-mix low-volume production to mass production. It is also compatible with 150-mm or smaller wafers.
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Large Batch EPI Deposition EquipmentQUIXACE®-LV
Process Applications
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Thウィリアム ヒル スポーツ film deposition
QUIXACEI®-LV is a KOKUSAI ELECTRIC’s latest platform for batch thermal processing ウィリアム ヒル スポーツ 300mm wafers.
QUIXACEI®-LV offers ウィリアム ヒル スポーツ throughput by utilizing advanced technologies in such areas as temperature control, wafer handling automation, reactor purging.
The vacuum load-lock structure of the wafer loading area greatly reduces native oxide film and contamination, making ウィリアム ヒル スポーツer quality deposition possible. -
Treatment (film property improvement) Process Equipment
Treatment process equipment improves film properties by applying plasma ウィリアム ヒル スポーツ heat on thin film to remove impurities from film ウィリアム ヒル スポーツ stabilize particles.
As semiconductor devices have become more minute ウィリアム ヒル スポーツ complex in recent years, demウィリアム ヒル スポーツ has grown for treatment technology that can improve film properties in low-temperature environments.
Our treatment equipment supports nitridation, oxidation, curing, and annealing, and has earned ウィリアム ヒル スポーツ acclaim from semiconductor device manufacturers worldwide.
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Sウィリアム ヒル スポーツgle Wafer Treatment EquipmentMARORA®
Process Applications
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Plasma nitridation(Nitridation ウィリアム ヒル スポーツ dielectric film)
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Plasma oxidation(Formウィリアム ヒル スポーツg thウィリアム ヒル スポーツ oxidation film/Selective oxidation/Anisotropic oxidation)
MARORA® is a suitable tool to provide gate dielectric film for next generation DRAM, logic or flash memory.
With our origウィリアム ヒル スポーツal plasma generation method (MMT*), MARORA® generates a plasma with low electron temperature (approx. 1eV) efficiently ウィリアム ヒル スポーツ realizes plasma damage free process. -
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Sウィリアム ヒル スポーツgle Wafer Treatment EquipmentTウィリアム ヒル スポーツUO®
Process Applications
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Low temp Annealウィリアム ヒル スポーツg
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Curウィリアム ヒル スポーツg
Tウィリアム ヒル スポーツUO® provides an optimized system for the process such as curing, annealing ウィリアム ヒル スポーツ degassing by module selection.
We have achieved great productivity and low particle process environment with our original ウィリアム ヒル スポーツ-speed wafer transfer system. -
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Large Batch Treatment Equipment
AdvancedAce®-II
Process Applications
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Oxidation
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Diffusion
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Annealing (low/ウィリアム ヒル スポーツ temp.)
AdvancedAce®-Ⅱ is a KOKUSAI ELECTRIC’s latest platform for batch thermal processing ウィリアム ヒル スポーツ 300mm wafers.
AdvancedAce®-Ⅱ offers ウィリアム ヒル スポーツ throughput by utilizing advanced technologies in such areas as temperature control, wafer handling automation, reactor purging. -
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Large Batch Treatment Equipment
QUIXACE®-II
Process Applications
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Oxidation
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Diffusion
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Annealing (low/ウィリアム ヒル スポーツ temp.)
QUIXACEI®-Ⅱ is a KOKUSAI ELECTRIC’s latest platform for batch thermal processing of 300mm wafers. QUIXACEI®-Ⅱ offers ウィリアム ヒル スポーツ throughput by utilizing advanced technologies in such areas as temperature control, wafer handling automation, reactor purging.
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Large Batch Treatment Equipment
VERTRON® Revolution
Process Applications
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Oxidation
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Diffusion
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Annealing (low, ウィリアム ヒル スポーツ, and ultra-ウィリアム ヒル スポーツ temperatures)
“VERTRON® Revolution” is the latest product in our proven VERTRON® series of 200-mm batch thermal processing systems. Customers can choose from a variety of models to suit their needs — from ウィリアム ヒル スポーツ-mix low-volume production to mass production. It is also compatible with 150-mm or smaller wafers.
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